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Go to Editorial ManagerPorous Silicon (PSi) samples with (100) orientation n-type were prepared by photo-electrochemical etching process for different variable parameters and fixed electrolyte solution HF:C2H5OH:H2O (2:3:3). Physical and optical properties of PSi would be varied with the variation of process parameters such as current density, anodization time and laser wavelengths. Two types of 50 mW diode lasers were chosen, 473 nm Blue & 532 nm green at 20 mA/cm2 & 15 min etching time to assist the iodization process. The band gap of the fabricated layer has raised up to (2.9 eV) which is more than twice its original value for the c-Si (1.12 eV). _x000D_ Exploiting the obtained gap energy values, the refractive index of porous silicon layer was calculated depending upon Vandamme empirical relation. It was observed that the porosity is modifiable through etching conditions, which in turn makes refractive index also modifiable. Thus, the calculation depended on taking certain parameters as the current density and etching time in order to compare the effect of applying the two laser wavelengths. AFM was applied to observe the homogeneity and roughness of the PSi mono-layer. The results are in a very good agreement with the range of the refractive indices of PSi and the illumination with green laser gives a better conclusion to use in solar cells as a good absorber and a bad reflector.
Surface reconstruction of silicon using lasers could be utilized to produce silicon nanostructures of various features. Electrochemical and photoelectrochemical etching processes of silicon were employed to synthesize nanostructured surface. Effects of current densities 5, 10 and 20 mA/cm2 on the surface features were examined. It is found that the surface porosity and layer thickness increase with the current density. Moreover, large surface area of 410 m2/cm3 can be achieved when laser power density 0f 0.6 W/cm2 was used during the etching process. Optimum operating conditions were found to achieve better silicon nanostructured surface features. The surface roughness can be reduced to 8.3 nm using laser beam of 650 nm irradiated the silicon surface during the photoelectrochemical etching process. The surface morphology of the nanostructured silicon surface using SEM and AFM could give rich details about the surface. Silver nanoparticles of 10 – 20 nm was embedded at the nanostructured silicon surface by LIFT process to reduce the surface resistance and maintain the large surface area. This technique enables silicon nanostructures to be efficiently used in many optoelectronic applications.
Laser annealing represents a powerful method for tailoring the properties of silver nanofilms on quartz substrates, offering advantages in terms of precision, scalability, and functionalization. Continued research efforts are expected to deepen our understanding and broaden the applications of this promising technology in diverse fields. In this work, laser annealing of silver nanofilms deposited on quartz substrates was performed and investigated. RF CO2 laser of variable power in the range 1–20 W with beam quality of 1.1 was used to anneal silver nanofilms. AFM analysis emphasized that nanocrystal sizes of 60 nm were obtained for silver nanofilms. Furthermore, the optimum absorbance peak occurred at about 449 nm for smaller film thickness. Thermal simulation and analysis of the annealing process were also conducted using COMSOL Multiphysics software. It was observed that optimal temperature of 729 K was achieved when 10 W laser power and 2 mm/s scanning speed were used to anneal 20 nm silver film thickness. Design of expert analysis was also used to better understand the laser annealing process of silver nanofilms since convolution of several process parameters affect the process output.
Two lasers were utilized for silicon processing using photoelectrochemical etching and laser texturing in order to produce nano/micro structures, respectively. Photoelectrochemical etching process utilizes a CW diode laser of 532 nm wavelength was used to support electrochemical etching for both n-type and p-type conductivity. While laser texturing process was employed using pulsed fiber laser of 1064 nm wavelength. Various characterization methods were devoted to examine silicon micro/nanostructures surfaces produced by lasers. These methods include AFM, SEM and Raman scattering to provide clear evidence about formation of micro/nanostructures abundant at silicon surfaces. Moreover, FTIR analysis for the laser produced silicon surfaces could emphasize whether the resultant silicon surface is hydrophilic or hydrophobic. Image analysis software adopted a side view micro image was used to measure the contact angle between the water droplet and silicon micro/nano-surfaces. It is found that the laser produced silicon nanostructure by photoelectrochemical etching creates a hydrophobic surface and even super hydrophobic with contact angle of 130 degrees for 50 nm average size. In addition, utilizing fiber laser of high repetition rate for laser texturing produces microstructures that are super hydrophilic with contact angle could reach 8 degrees for a surface dimension of 50 μm.
The microstructural analysis and electrochemical measurements tests were used to investigate the behaviors of (TiO2) and (HAp)-coated Ti-6Al-7Nb alloy in the SBF solution .By using RF sputtering, a thin TiO2 layer coated the substrate, while a thick layer of HAp coated the outer side of surface. The generated middle layer consist of the composite of TiO2 and HAp which is by AFM characterized as uniformly distributed coating system with nano size. The images of the scan electron microscopy (SEM) shows that there is no any cracking observed in the outer layer of tested samples due to the use of thin film TiO2 as mid lead to reduce the difference in the thermal expansion between the HAp material and Ti-6Al-7Nb substrate .The HAp upper layer significantly improve the bioactivity of the Ti-6Al-7Nb alloy. In this study, the bonding strength and the corrosion resistance was improved by using thin layer of TiO2. From electrochemical impedance spectroscopy (EIS) study Bod plot, the composite layer of TiO2 and HAp was suggested by the capacitive act as barrier layer coated substrate and prevent the relays of the ion from metallic. The results shows the values of Rox (309.2 k? cm2)are greater than for Rct(19.2 k? cm2), by assumes the presence oxide film increases for coated substrate are greater than that of uncoated, which is a result of the presence of coated film that improve the corrosion resistance of the sample.
The mixing technique was applied in this study to enhance the strength performance of the cement. The addition of 3% by weight of hydroxyapatite (HA) nanoparticles were mixed with 97% polymethyl methacrylate (PMMA) acrylic polymer, which has a nano size to serve as the matrix material. The surface roughness and continuous porosity of the bone cement were found to be slightly increased by the incorporation of nanoparticles, which enhanced bone-implant osseointegration and ingrowth. Atomic force microscopy (AFM) analysis revealed that the addition of hydroxyapatite (HAp) nanoparticles resulted in a surface roughness value (Sa) of 16.25 nm, which is similar to that of natural bone. The energy-dispersive X-ray spectroscopy (EDS) mapping results discover precentor material and uniform distribution. The Sample exhibited promising results in the antibacterial test, showing efficacy against bacteria both with and without sterilization, confirming its antibacterial properties. The mechanical tests conducted on the sample, including tensile, compression, bending and Vickers hardness tests, yielded favorable results and indicated that the sample is suitable for its intended application. In the theoretical works the design of the bone, screw, and bone plate was conducted using SolidWorks, followed by an analysis using ANSYS under both axial and bending load conditions. The theoretical analysis revealed that the safety factor was less than 1 when an axial load of 13 N was applied and a bending load of 2 N was applied, indicating that the structure may not be able to withstand these loads safely. Under both ambient and physiologically relevant conditions in the human body, HA and PMMA have demonstrated to be excellent choices for enhancing the clinical performance of bone cement. This, in turn, can lead to increased longevity of implants, decreased patient risk, and lower healthcare costs
The present work was designed on producing nanohydroxyapatite layers using electrophoretic deposition (EPD) on 316L stainless steel substrate. The EPD coatings were prepared by the deposition of hydroxyapatite (HA)-chitosan nanocomposites on different substrate roughness (polish surface, 220 grit SiC grind, and sand blast surfaces). Depositions were performed using the suspensions of HA nano particles (3 g/L) in the mixture of alcohol and distilled water (ethanol, 5 vol. %water and containing 0.5 g/L of chitosan dissolved in 1 vol.% acetic acid. Coatings were achieved on the cathode at constant voltage, time and temperature (90 V, 5 min and 40 °C respectively); the pH value was performed and fitted at 4. After deposition, the coated samples were dried at room temperature for 24 h. The surface topography of coatings was analyzed using atomic force microscopy (AFM). SEM was used to postulate both the surface and the cross section morphology of the coatings. The adhesion bonding between the deposited coatings and substrate were measured using tape tester to evaluate the adhesion bonding between the coating and substrate. The results showed the deposited coatings on sand blasted substrate has less porosity compared with the polish surface and 220 emery paper SiC grinding substrate respectively. The coating on the sand blasted substrate showed higher nanoroughness (122 nm), better adhesion bonding (removal area 15%) and higher thickness layer (12 µm) than that of the polish substrate and 220 emery paper SiC grinding substrate.
Magnesium oxide nanoparticles were deposited by laser pyrolysis process. Three types of lasers were employed CW CO2, Q-switched Nd-YAG (short pulses) and long pulses Nd-YAG lasers. The size and density of nanoparticles vary with laser energy, power, pulse duration and the scanning speed of the laser. In this method, MgO nanoparticles were deposited by a laser beam on a quartz substrate from aqueous solution of magnesium nitrate. AFM images reveal formation of small nanoparticle size of 24.5 nm with surface roughness 6.97nm by Q-switched Nd-YAG laser (10 ns) when the energy was 1J. While for CO2 laser, the smallest size was 18.8 nm at 0.4mm/s scanning speed with surface roughness 5.21nm at the same scanning speed. Moreover, long Nd-YAG pulses laser produces relatively larger average size of 37.5nm at 0.8ms pulse duration. The absorption spectra from UV-Visible spectroscopy were also conducted. The best absorption intensity was obtained at a wavelength ranging between 420-430 nm for both lasers. Finally, Thermal analysis using COMSOL Multiphysics software for the deposition process reveals that maximum temperature about 440Kfor Q-Switched Nd-YAG laser at 1J laser energy. While for RF CO2 laser, the maximum temperature obtained at 0.4mm/s scanning speed is 850K.This work provides a good knowledge for the deposition of nanoparticles using laser beams.
The aim of this work is to determine the optimum parameters for deposition of chitosan and mixture of chitosan and hydroxyapatite (HA) layers using electrophoretic deposition. The layers were on 316L stainless steel substrate. Taguchi approach was utilized to select the optimum parameters for both layers. The parameters used for deposition chitosan are voltage, time and temperature while the parameters used for HA and chitosan are voltage, time, concentration and temperature. Zeta potential tests were employed to measure the solutions stability. Coating layers were characterized for thickness, porosity and nanoroughness using optical microscopy (OM) and atomic force microscopy (AFM). The results from Taguchi design of experiments demonstrated that the best conditions for deposition of chitosan and HA layers are 50 V, 5 min, 3 g HA/L and 30°C. The corresponding thickness, % porosity, nanoroughness and microroughness for optimum conditions were 22 µm, 3.53, 4.48 nm and 3.85 µm respectively.