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Go to Editorial ManagerPorous Silicon (PSi) samples with (100) orientation n-type were prepared by photo-electrochemical etching process for different variable parameters and fixed electrolyte solution HF:C2H5OH:H2O (2:3:3). Physical and optical properties of PSi would be varied with the variation of process parameters such as current density, anodization time and laser wavelengths. Two types of 50 mW diode lasers were chosen, 473 nm Blue & 532 nm green at 20 mA/cm2 & 15 min etching time to assist the iodization process. The band gap of the fabricated layer has raised up to (2.9 eV) which is more than twice its original value for the c-Si (1.12 eV). _x000D_ Exploiting the obtained gap energy values, the refractive index of porous silicon layer was calculated depending upon Vandamme empirical relation. It was observed that the porosity is modifiable through etching conditions, which in turn makes refractive index also modifiable. Thus, the calculation depended on taking certain parameters as the current density and etching time in order to compare the effect of applying the two laser wavelengths. AFM was applied to observe the homogeneity and roughness of the PSi mono-layer. The results are in a very good agreement with the range of the refractive indices of PSi and the illumination with green laser gives a better conclusion to use in solar cells as a good absorber and a bad reflector.
Two lasers were utilized for silicon processing using photoelectrochemical etching and laser texturing in order to produce nano/micro structures, respectively. Photoelectrochemical etching process utilizes a CW diode laser of 532 nm wavelength was used to support electrochemical etching for both n-type and p-type conductivity. While laser texturing process was employed using pulsed fiber laser of 1064 nm wavelength. Various characterization methods were devoted to examine silicon micro/nanostructures surfaces produced by lasers. These methods include AFM, SEM and Raman scattering to provide clear evidence about formation of micro/nanostructures abundant at silicon surfaces. Moreover, FTIR analysis for the laser produced silicon surfaces could emphasize whether the resultant silicon surface is hydrophilic or hydrophobic. Image analysis software adopted a side view micro image was used to measure the contact angle between the water droplet and silicon micro/nano-surfaces. It is found that the laser produced silicon nanostructure by photoelectrochemical etching creates a hydrophobic surface and even super hydrophobic with contact angle of 130 degrees for 50 nm average size. In addition, utilizing fiber laser of high repetition rate for laser texturing produces microstructures that are super hydrophilic with contact angle could reach 8 degrees for a surface dimension of 50 μm.
Surface reconstruction of silicon using lasers could be utilized to produce silicon nanostructures of various features. Electrochemical and photoelectrochemical etching processes of silicon were employed to synthesize nanostructured surface. Effects of current densities 5, 10 and 20 mA/cm2 on the surface features were examined. It is found that the surface porosity and layer thickness increase with the current density. Moreover, large surface area of 410 m2/cm3 can be achieved when laser power density 0f 0.6 W/cm2 was used during the etching process. Optimum operating conditions were found to achieve better silicon nanostructured surface features. The surface roughness can be reduced to 8.3 nm using laser beam of 650 nm irradiated the silicon surface during the photoelectrochemical etching process. The surface morphology of the nanostructured silicon surface using SEM and AFM could give rich details about the surface. Silver nanoparticles of 10 – 20 nm was embedded at the nanostructured silicon surface by LIFT process to reduce the surface resistance and maintain the large surface area. This technique enables silicon nanostructures to be efficiently used in many optoelectronic applications.
Whispering Gallery Mode Micro-Resonators (WGMRs) have received significant interest due to their great sensitivity to environmental changes, compact size, and ability to operate over a wide spectral range because their low optical losses produce high-quality factors so that they can be used in various sensing applications. This work investigates the design and implementation of cylindrical WGMRs for Refractive Index (RI) sensing for different delivery fiber diameters. Single Mode Fiber with different waist diameters (80,67.1,18) µm were used as delivery fibers. At the same time, the sensor (resonator) fiber is SMF with a diameter (125 µm). Quality factors and Free Spectral Range (FSR) were calculated and analyzed for each diameter. The quality factor for all diameters was in power of 104, which is considered good. The FSR is inversely proportional to fiber diameter. FSR values were (0.678,1.75,2.03) nm for (80,67.1,18) µm delivery fiber diameters respectively. An analyte prepared by NaCl with different refractive indices is used to investigate the RI sensor performance. Higher sensitivity is obtained from the WGMR with a smaller waist diameter, which is (-)74 nm/RIU. While for the delivery fiber diameters (80,67.1) µm were (-0.28, -9.27) nm/RIU respectively. The submitted sensor will have a good contribution in the field of chemical, biological and medical applications.