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Go to Editorial ManagerSurface reconstruction of silicon using lasers could be utilized to produce silicon nanostructures of various features. Electrochemical and photoelectrochemical etching processes of silicon were employed to synthesize nanostructured surface. Effects of current densities 5, 10 and 20 mA/cm2 on the surface features were examined. It is found that the surface porosity and layer thickness increase with the current density. Moreover, large surface area of 410 m2/cm3 can be achieved when laser power density 0f 0.6 W/cm2 was used during the etching process. Optimum operating conditions were found to achieve better silicon nanostructured surface features. The surface roughness can be reduced to 8.3 nm using laser beam of 650 nm irradiated the silicon surface during the photoelectrochemical etching process. The surface morphology of the nanostructured silicon surface using SEM and AFM could give rich details about the surface. Silver nanoparticles of 10 – 20 nm was embedded at the nanostructured silicon surface by LIFT process to reduce the surface resistance and maintain the large surface area. This technique enables silicon nanostructures to be efficiently used in many optoelectronic applications.
Magnesium oxide nanoparticles were deposited by laser pyrolysis process. Three types of lasers were employed CW CO2, Q-switched Nd-YAG (short pulses) and long pulses Nd-YAG lasers. The size and density of nanoparticles vary with laser energy, power, pulse duration and the scanning speed of the laser. In this method, MgO nanoparticles were deposited by a laser beam on a quartz substrate from aqueous solution of magnesium nitrate. AFM images reveal formation of small nanoparticle size of 24.5 nm with surface roughness 6.97nm by Q-switched Nd-YAG laser (10 ns) when the energy was 1J. While for CO2 laser, the smallest size was 18.8 nm at 0.4mm/s scanning speed with surface roughness 5.21nm at the same scanning speed. Moreover, long Nd-YAG pulses laser produces relatively larger average size of 37.5nm at 0.8ms pulse duration. The absorption spectra from UV-Visible spectroscopy were also conducted. The best absorption intensity was obtained at a wavelength ranging between 420-430 nm for both lasers. Finally, Thermal analysis using COMSOL Multiphysics software for the deposition process reveals that maximum temperature about 440Kfor Q-Switched Nd-YAG laser at 1J laser energy. While for RF CO2 laser, the maximum temperature obtained at 0.4mm/s scanning speed is 850K.This work provides a good knowledge for the deposition of nanoparticles using laser beams.